Electron beam lithography is the process of direct-writing on a surface covered with an electron-sensitive film (resist). This process is facilitated by scanning a focused beam of electrons on the surface. The electron beam enables selective removal of some regions of the resist.
Electron beam lithography shares the same purpose as photolithography. They create very small structures in the resist, which are then transferred to the substrate material by etching. In this article, we'll be looking at the processes involved with photolithography and electron beam lithography.
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Published 4 years ago
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